Polishing Plate

Polishing Plate

Achieves excellent hardness and wear resistance by adopting high-purity ceramics.

High hardness and excellent wear resistance can be obtained by adopting high-purity ceramics in the wafer polishing process, and a good surface condition can be maintained for long-term use.

Keywords: High hardness, Wear resistance

Product data

Polishing Plate
Material Alumina
Shape Convex, concave, and flat surfaces are available
Size MAXφ40"
Accuracy Flatness 1 μm or less
Application example Wafer fixing jig