Polishing Plate
Achieves excellent hardness and wear resistance by adopting high-purity ceramics.
High hardness and excellent wear resistance can be obtained by adopting high-purity ceramics in the wafer polishing process, and a good surface condition can be maintained for long-term use.
Keywords: High hardness, Wear resistance
Product data
| Polishing Plate | |
|---|---|
| Material | Alumina |
| Shape | Convex, concave, and flat surfaces are available |
| Size | MAXφ40" |
| Accuracy | Flatness 1 μm or less |
| Application example | Wafer fixing jig |